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Beilstein J. Nanotechnol. 2018, 9, 954–962, doi:10.3762/bjnano.9.89
Figure 1: Cross-sectional (top) and top-view (bottom) SEM images of tilted Al columns deposited at an inciden...
Figure 2: (a) Calculated in-plane pole figures for the cubic Al{200} and (b) Al{111} planes in a vertically (...
Figure 3: Schematic illustration of a tilted Al column deposited on a thermally oxidized Si substrate at an o...
Figure 4: Cross-sectional SEM images of tilted metallic columns deposited at an incidence angle of 82° on the...
Figure 5: Column tilt angles of (a) low-melting metals Al, Ni and (b) high-melting metals Ta, Mo and Cr depos...
Figure 6: βθ=90°-values for Ta, Mo and Al columns depending on the homologous temperature (for explanation se...
Figure 7: Porosity of (a) Ta, Mo and Cr and (b) Ni and Al thin films versus incidence angle.
Beilstein J. Nanotechnol. 2014, 5, 2164–2170, doi:10.3762/bjnano.5.225
Figure 1: MD configuration of a GaN step with a step height of h = 2c during indentation of surface atoms wit...
Figure 2: Stress fluctuation multiplied by the squared per-atom volume along the y-axis of the upper Ga atom...
Figure 3: Local [001]-oriented indentation modulus for three different step heights along the y-axis. Measure...
Figure 4: [001]-oriented indentation modulus for three different step heights along y. Measured by indenting ...
Figure 5: Schematic FEM configuration of the indentation on top of the step by using a flatpunch indenter.
Figure 6: FEM simulation of indentation modulus for three different step heights by using a flatpunch indente...
Figure 7: Topography (a) and indentation modulus (b) map of the area around a GaN step.